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All-dielectric metasurface for high-performance structural color

机译:用于高性能结构颜色的全电介质元表面

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The achievement of structural color has shown advantages in large-gamut, high-saturation, high-brightness, and high-resolution. While a large number of plasmonic/dielectric nanostructures have been developed for structural color, the previous approaches fail to match all the above criterion simultaneously. Herein we utilize the Si metasurface to demonstrate an all-in-one solution for structural color. Due to the intrinsic material loss, the conventional Si metasurfaces only have a broadband reflection and a small gamut of 78% of sRGB. Once they are combined with a refractive index matching layer, the reflection bandwidth and the background reflection are both reduced, improving the brightness and the color purity significantly. Consequently, the experimentally demonstrated gamut has been increased to around 181.8% of sRGB, 135.6% of Adobe RGB, and 97.2% of Rec.2020. Meanwhile, high refractive index of silicon preserves the distinct color in a pixel with 2?×?2 array of nanodisks, giving a diffraction-limit resolution.
机译:结构颜色的实现在大型色域,高饱和度,高亮度和高分辨率方面具有优势。虽然已经开发了大量的等离子体/介电纳米结构用于结构颜色,但之前的方法无法同时匹配所有上述标准。这里我们利用Si Metasurface来展示用于结构颜色的一体化解决方案。由于内在的物质损失,传统的Si元胶片仅具有宽带反射和SRGB的78%的小型色域。一旦它们与折射率匹配层组合,反射带宽和背景反射都会减小,显着提高亮度和颜色纯度。因此,实验证明的色域已增加到SRGB的181.8%,135.6%的Adobe RGB,97.2%的Rec.2020。同时,硅的高折射率在具有2Ω×2阵列的纳米询度中保留了像素中的不同颜色,给出了衍射极限分辨率。

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