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首页> 外文期刊>RSC Advances >Nitroxide-mediated polymerization of pentafluorostyrene initiated by PS–DEPN through the surface of APTMS modified fumed silica: towards functional nanohybrids
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Nitroxide-mediated polymerization of pentafluorostyrene initiated by PS–DEPN through the surface of APTMS modified fumed silica: towards functional nanohybrids

机译:通过PS-DEPN通过PS-DEPN通过APTMS改性的熏蒸二氧化硅表面引发的戊氟苯乙烯的介导聚合:朝向功能性纳米嗜型

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摘要

Polypentafluorostyrene (PPFS) chains were anchored on the surface of silica nanoparticles (Aerosil A200 fumed silica) by nitroxide-mediated polymerization (NMP) with PS–DEPN as macroinitiator using a “grafting through” strategy with (acryloxypropyl)trimethoxysilane (APTMS)-modified silica. First, NMP of PFS was evaluated with and without silica in various solvents (namely N -methyl-2-pyrrolidone – MP, N , N -dimethylformamide – DMF, and toluene) that favor the dispersion of APTMS-silica in reaction medium. In both situations, polymerization presents all the features of a controlled process whatever the solvent is, with a marked impact of the solvent polarity on the kinetics. Moreover, NMP of PFS is faster in polar solvents when conducted in presence of APTMS-modified silica. By tuning polymerization time and/or solvent polarity, the weight ratio of organic matter to silica can be tuned from 5 to 32 wt%. The impact of such modification rate is demonstrated on the surface properties of SiO _(2) -PS- b -PPFS deposited on a silicon wafer: indeed, introduction of fluorinated segments in combination with dual roughness (due to inherent dimensions of fumed silica) lead to relevant hydrophobic surface properties with water contact angle as high as (132 ± 1.7)°.
机译:通过用(丙烯酰氧基丙基)三甲氧基硅烷(APTMS)(AP​​TMS)(AP​​TMS)(AP​​TMS)用“嫁接通过”策略,通过氮氧化物介导的聚合(NMP)在二氧化硅纳米粒子(Aerosil A200气相二氧化硅)上锚定在二氧化硅纳米颗粒(Aerosil A200气相二氧化硅)的表面上锚定。二氧化硅。首先,在各种溶剂中使用二氧化硅(即N-甲基-2-吡咯烷酮 - MP,N,N-二甲基甲酰胺-DMF和甲苯)进行评估,并且在反应介质中分散APTMS-二氧化硅的分散,评价PFS的NMP。在这种情况下,无论溶剂是什么,聚合都呈现了受控过程的所有特征,具有溶剂极性对动力学的显着影响。此外,在存在APTMS改性二氧化硅的存在时,极性溶剂的NMP在极性溶剂中更快。通过调节聚合时间和/或溶剂极性,可以从5至32wt%调谐到二氧化硅的有机物质的重量比。在沉积在硅晶片上的SiO_(2)-P-P-P-P-P-P-P-PPF的表面性质上证明了这种修饰率的影响:实际上,与双粗糙度组合引入氟化区段(由于熏蒸二氧化硅的固有尺寸)导致相关的疏水性表面性能,水接触角高达(132±1.7)°。

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