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Modulation of N-bonding configurations and their influence on the electrical properties of nitrogen-doped graphene

机译:N键合配置的调节及其对氮掺杂石墨烯电性能的影响

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Nitrogen-doped graphene (NG) films have been grown on Cu foils by using imidazole (C _(3) H _(4) N _(2) ) and PMMA as solid N and C sources. The results show that the pyridinic and pyrrolic nitrogen-bonding configurations and the N doping concentration can be effectively modulated by the hydrogen flux. In addition, it reveals that the defect density of the NG film is dominated by the pyridinic-N configuration instead of the pyrrolic-N configuration from the Raman spectra. Furthermore, from the electrical measurements, it is concluded that the pyrrolic-N configuration has stronger donor ability, and lower carrier scattering than those of pyridinic-N configuration. This study provides fundamental insights to understand the role of various N-bonding configurations, but also give guidance to synthesize the NG with controllable N-bonding configurations.
机译:通过使用咪唑(C _(3)H _(4)N _(2))和PMMA作为固体N和C来源,在Cu箔上生长在Cu箔上的氮掺杂石墨烯(Ng)薄膜。结果表明,通过氢气通量可以有效地调节吡啶碱和吡咯氮键合配置和N掺杂浓度。另外,它揭示了Ng膜的缺陷密度由吡啶-N构型来代替来自拉曼光谱的吡咯基配置。此外,从电测量中,得出结论,吡咯型型构型具有较强的供体能力,并且比吡啶-N构型较低的载波散射。本研究提供了了解各种N键合配置的作用的基本见解,而且还提供了用可控的N键合配置合成NG的指导。

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