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Pulsed laser deposited CoFe2O4 thin films as supercapacitor electrodes

机译:脉冲激光沉积CoFe2O4薄膜作为超级电容器电极

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The influence of the substrate temperature on pulsed laser deposited (PLD) CoFe _(2) O _(4) thin films for supercapacitor electrodes was thoroughly investigated. X-ray diffractometry and Raman spectroscopic analyses confirmed the formation of CoFe _(2) O _(4) phase for films deposited at a substrate temperature of 450 °C. Topography and surface smoothness was measured using atomic force microscopy. We observed that the films deposited at room temperature showed improved electrochemical performance and supercapacitive properties compared to those of films deposited at 450 °C. Specific capacitances of about 777.4 F g ~(?1) and 258.5 F g ~(?1) were obtained for electrodes deposited at RT and 450 °C, respectively, at 0.5 mA cm ~(?2) current density. The CoFe _(2) O _(4) films deposited at room temperature exhibited an excellent power density (3277 W kg ~(?1) ) and energy density (17 W h kg ~(?1) ). Using electrochemical impedance spectroscopy, the series resistance and charge transfer resistance were found to be 1.1 Ω and 1.5 Ω, respectively. The cyclic stability was increased up to 125% after 1500 cycles due to the increasing electroactive surface of CoFe _(2) O _(4) along with the fast electron and ion transport at the surface.
机译:彻底研究了用于超级电容器电极的脉冲激光沉积(PLD)COFE _(2)O _(4)薄膜的脉冲激光沉积(PLD)COFE _(2)薄膜的影响。 X射线衍射测定和拉曼光谱分析证实了在沉积在450℃的底物温度下沉积的薄膜的CoFe _(2)O _(4)相的形成。使用原子力显微镜测量地形和表面平滑度。我们观察到,与在450℃下沉积的薄膜相比,在室温下沉积在室温下的薄膜显示出改善的电化学性能和超级电容性。在室温和450℃下沉积在0.5 mA cm〜(Δ2)电流密度,获得约777.4fg〜(α1)和258.5f g〜(α1)的特定电容。在室温下沉积的CoFe _(2)O _(4)膜表现出优异的功率密度(3277Wkg〜(α1))和能量密度(17WH kg〜(α1))。使用电化学阻抗光谱,串联电阻和电荷传递电阻分别为1.1Ω和1.5Ω。由于CoFe _(2)O _(4)的电活性表面以及表面上的快速电子和离子传输,循环稳定性在1500次循环后增加了125%。

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