In Situ Growth of ZnO inside a Porous Silicon Matrix Obtained by Electrochemical Etching with a Hydrofluoric Acid-Formaldehyde Solution

摘要

We present zinc oxide (ZnO) particles obtained inside a porous silicon matrix in the same electrolytic process using a p-type silicon wafer in a hydrofluoric acid (HF) solution containing formaldehyde (CH2O) and hydrated zinc sulfate as additives. The X-ray diffraction pattern of the sample confirmed the presence of ZnO with a hexagonal-type wurtzite structure. Photoluminescence (PL) spectra of the samples, before and after the functionalization process, were measured to observe the effect of ZnO inside the porous silicon. The PL measurements of porous silicon functionalized with ZnO (ZnO/PS) revealed infrared, red, blue, and ultraviolet emission bands. The ultraviolet region corresponds to the band-band emission of ZnO, and the visible emission is attributed to defects. The results of the nitrogen adsorption/desorption isotherms of the PS and ZnO/PS samples revealed larger BET surface areas and pore diameters for the ZnO/PS sample. We conclude that ZnO/PS can be obtained in a one-step electrolytic process. These types of samples can be used in gas sensors and photocatalysis.