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首页> 外文期刊>E-Journal of Surface Science and Nanotechnology >Spatial Analytical Surface Structure Mapping for Three-dimensional Micro-shaped Si by Micro-beam Reflection High-energy Electron Diffraction
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Spatial Analytical Surface Structure Mapping for Three-dimensional Micro-shaped Si by Micro-beam Reflection High-energy Electron Diffraction

机译:微光束反射高能电子衍射三维微形Si的空间分析表面结构映射

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摘要

Spatially arranged surfaces on the micro-rod structure, which was three-dimensionally (3D) architected on a Si(110) substrate have been thoroughly investigated by a system with micro-beam reflection high-energy electron diffraction (μ-RHEED) and scanning electron microscopy (SEM). The combination of μ-RHEED and SEM realized analytical structure investigation of 3D surfaces with the spatial resolution of sub micrometer for the 3D rectangular shaped rod consisting of a (110) top surface (20 μm wide) and {111} vertical side surfaces (10 μm wide). Exhaustive mapping revealed the peculiar reconstructed surface structures: Si(110) “16 × 2” single domain and {35 47 7} facet surfaces locally appeared on the interconnected edge region on the 3D structure in addition to the “16 × 2” and 7 × 7 super structures on flat top (110) and side {111} surfaces, respectively. The formation mechanism for “16 × 2” single-domain structure near the corner edge of the (110) surfaces and {35 47 7} facets on the corner edges between (110) and {111} surfaces were discussed from the viewpoint of the surface stability on the 3D geometrical shaped Si structure.
机译:通过具有微光束反射高能量电子衍射(μ-Rabeed)和扫描的系统已经彻底研究了在Si(110)基板上的三维(3D)上的微杆结构上的空间布置的表面。电子显微镜(SEM)。 μ-Rabeed和SEM实现分析结构研究3D矩形尺度的3D矩形杆的空间分辨率,包括(110)顶表面(20μm宽)和{111}垂直侧表面(10 μm宽)。详尽的映射显示了特殊的重建表面结构:Si(110)“16×2”单个域和{35 47 7}除了“16×2”和7之外,在3D结构上的互连边缘区域上局部出现在互连边缘区域上。 ×7超顶(110)和侧面{111}表面上的超结构。从(110)和{111}表面之间的拐角边缘的(110)表面和{35 47 7}刻面附近的“16×2”单域结构附近的形成机制是(110)和{111}表面之间的3D几何形状Si结构的表面稳定性。

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