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Snapback-free base resistance controlled thyristor with floating N-region

机译:带浮动N区的无循环底电阻控制晶闸管

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An analysis model of snapback voltage for the base resistance controlled thyristor (BRT) is developed in this paper. It’s shown that, improving hole current flowing into P-base region is an important way to suppress snapback phenomenon during forward conducting state. Thus, a new BRT with a floating N-region in N-drift layer is proposed. In this new structure, the floating N-region introduces a hole potential barrier in parasitic PNP to prevent holes from being swept into cathode. Then, almost all of hole current flow into P-base to trigger latch-up effect and the parasitic PNP transistor is greatly suppressed. Thus, snapback is significantly suppressed. Numerical simulation results show that, when doping level and length of floating N-region are 8.0 × 1015 cm?3 and 5.0 μm, snapback-free can be realized, and pulse discharge performance and turn on characteristics are greatly improved meanwhile the high blocking capability is maintained.
机译:本文开发了基于电阻控制晶闸管(BRT)的转印电压分析模型。图3示出了,改善流入P基区区域的孔电流是在前向导电状态期间抑制卷卷现象的重要途径。因此,提出了具有N漂移层中浮动N区的新BRT。在这种新结构中,浮动N区在寄生PNP中引入孔电位屏障,以防止孔被扫入阴极中。然后,几乎所有孔电流流入p碱以触发闩锁效果,并且寄生PNP晶体管大大抑制。因此,显着抑制了跃点。数值模拟结果表明,当掺杂水平和浮动N区的长度为8.0×1015cm?3和5.0μm时,可以实现快速性,并且脉冲放电性能和开启特性大大提高了高拦阻能力被维持。

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