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Interference experiment with asymmetric double slit by using 1.2-MV field emission transmission electron microscope

机译:使用1.2-MV场发射透射电子显微镜,采用不对称双切口的干扰实验

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Advanced electron microscopy technologies have made it possible to perform precise double-slit interference experiments. We used a 1.2-MV field emission electron microscope providing coherent electron waves and a direct detection camera system enabling single-electron detections at a sub-second exposure time. We developed a method to perform the interference experiment by using an asymmetric double-slit fabricated by a focused ion beam instrument and by operating the microscope under a “pre-Fraunhofer” condition, different from the Fraunhofer condition of conventional double-slit experiments. Here, pre-Fraunhofer condition means that each single-slit observation was performed under the Fraunhofer condition, while the double-slit observations were performed under the Fresnel condition. The interference experiments with each single slit and with the asymmetric double slit were carried out under two different electron dose conditions: high-dose for calculation of electron probability distribution and low-dose for each single electron distribution. Finally, we exemplified the distribution of single electrons by color-coding according to the above three types of experiments as a composite image.
机译:先进的电子显微镜技术使得可以进行精确的双缝干扰实验。我们使用了1.2MV的场发射电子显微镜,提供相干电子波和直接检测相机系统,使单秒曝光时间能够单电子检测。我们开发了一种通过使用由聚焦离子束仪器制造的不对称双切口来执行干扰实验的方法,并通过在“前弗劳恩霍尔”条件下进行显微镜,与传统的双缝实验的Fraunhofer条件不同。这里,前弗劳霍夫条件意味着在Fraunhofer条件下进行每个单狭缝观察,而在菲涅耳状态下进行双缝观察。在两个不同的电子剂量条件下进行每个单个狭缝和不对称双切口的干扰实验:高剂量,用于计算电子概率分布和每个单个电子分布的低剂量。最后,我们通过根据上述三种类型的实验作为复合图像来示例通过颜色编码来分布单个电子。

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