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Effects of graphene intercalation on dielectric reliability of HfO 2 and modulation of effective work function for Ni/Gr/c-HfO 2 interfaces: first-principles study

机译:石墨烯嵌入对HFO 2介电理可靠性的影响及NI / GR / C-HFO 2界面的有效功函数的调节:第一原理研究

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We have investigated the effects of graphene intercalation on dielectric reliability of HfO2 for Ni/Gr/HfO2 interfaces, and the effects of graphene intercalation and interfacial atom vacancy on the effective work function (EWF) of Ni/Gr/HfO2 interfaces using first-principle calculation based on density functional theory. The calculated results indicate that graphene intercalation can improve dielectric reliability of HfO2 dielectric even for the interfaces having interfacial oxygen vacancy or a small amount carbon vacancy. Moreover, the calculated results indicate that, inserting graphene into Ni/HfO2 interface induces the EWF’s to decline, and controlling interfacial oxygen or carbon vacancy can effectively tune the EWF of Ni/Gr/HfO2 interface. Our work strongly suggests that the use of graphene synthesized into Ni/HfO2 interface is a very effective way to improve the interface quality, and controlling interfacial oxygen or carbon vacancy is also an attractive and promising way for modulating the EWF of Ni/Gr/HfO2 interfaces.
机译:我们已经研究了石墨烯嵌入对Ni / Gr / hfo2接口的HfO2介电可靠性的影响,以及石墨烯嵌入和界面原子空位对NI / GR / HFO2接口的有效功函数(EWF)的影响使用第一原理基于密度泛函理论的计算。计算结果表明,即使对于具有界面氧空位的界面或少量碳空位,石墨烯嵌入也可以提高HFO2电介质的介电可靠性。此外,计算结果表明,将石墨烯插入Ni / HfO2界面诱导EWF下降,并控制界面氧或碳空位可以有效地调整Ni / Gr / HfO2界面的EWF。我们的工作强烈表明,将合成的石墨烯与Ni / HFO2接口的使用是一种非常有效的方法来提高界面质量,控制界面氧气或碳空位也是调节Ni / Gr / hfo2的eWF的有吸引力和有希望的方式接口。

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