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Gradient Permittivity Meta-Structure model for Wide-field Super-resolution imaging with a sub-45?nm resolution

机译:梯度介电常数元结构模型,具有Sub-45〜45的宽场超分辨率成像

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A gradient permittivity meta-structure (GPMS) model and its application in super-resolution imaging were proposed and discussed in this work. The proposed GPMS consists of alternate metallic and dielectric films with a gradient permittivity which can support surface plasmons (SPs) standing wave interference patterns with a super resolution. By employing the rigorous numerical FDTD simulation method, the GPMS was carefully simulated to find that the period of the SPs interference pattern is only 84 nm for a 532 nm incident light. Furthermore, the potential application of the GPMS for wide-field super-resolution imaging was also discussed and the simulation results show that an imaging resolution of sub-45 nm can be achieved based on the plasmonic structure illumination microscopic method, which means a 5.3-fold improvement on resolution has been achieved in comparison with conventional epifluorescence microscopy. Moreover, besides the super-resolution imaging application, the proposed GPMS model can also be applied for nanolithography and other areas where super resolution patterns are needed.
机译:提出了梯度介电常数元结构(GPMS)模型及其在该工作中的超分辨率成像中的应用。所提出的GPMS由具有梯度介电常数的替代金属和介电膜组成,该梯度介电常数可以支持具有超分辨率的表面等离子体(SPS)驻波干涉图案。通过采用严格的数值FDTD仿真方法,仔细模拟GPMS以发现SPS干涉图案的时段仅为532nm入射光仅为84nm。此外,还讨论了GPMS对宽场超分辨率成像的潜在应用,并且模拟结果表明,基于等离子体结构照明微观方法可以实现Sub-45nm的成像分辨率,这意味着5.3-与常规离荧光显微镜相比,已经实现了分辨率的改善。此外,除了超分辨率的成像应用之外,还可以应用所提出的GPMS模型,用于纳米线和需要超分辨率模式的其他区域。

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