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APS -2017 Annual Meeting of the APS Mid-Atlantic Section- Event - Aqueous Semiconductor Interface Structure and Electrochemical Energy Level Alignment.

机译:APS -2017 APS中大西洋部分的年会 - 活动 - 水半导体界面结构和电化学能级对准。

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Understanding structure-function relationships at aqueous semiconductor interfaces must start from the discovery of the key interface structure motifs themselves. Important examples include the alignment of electrochemical redox levels with the semiconductor band edges and the identification of catalytic active sites. We simulate interface structure using ab initio molecular dynamics (AIMD) [1]. The degree to which interface water molecules are dissociated depends on the specific semiconductor. The proximal hydration layer structure affects the kinetic processes that control the interface equilibration. To connect the interface structure to the electrochemical redox levels, the calculated, average interface dipole is combined with the GW approach from many-body perturbation theory to calculate the energy level alignment between the semiconductor band edges and the centroid of the occupied 1b$_{mathrm{1}}$ energy level of water and thus, the electrochemical levels [2]. The degree of interface water dissociation and the dynamical flexibility of the hydration layer both affect the level alignment. Finally, the presence of protons and hydroxyl groups at the interface affect hole localization. Results will be discussed for GaN, ZnO, and both rutile and anatase forms of TiO$_{mathrm{2}}$.[1] N. Kharche, et al., extit{Phys. Chem. Chem. Phys.} 16, 12057 (2014).[2] N. Kharche, et al., extit{Phys. Rev. Lett.} 113, 176802 (2014).
机译:了解水半导体接口的结构功能关系必须从密钥接口结构图案的发现开始。重要的实例包括与半导体带边的电化学氧化还原水平的对准和催化活性位点的鉴定。我们使用AB Initio分子动力学(AIMD)模拟界面结构[1]。界面水分子被解离的程度取决于特定的半导体。近端水合层结构影响控制界面平衡的动力学过程。为了将界面结构连接到电化学氧化还原水平,计算的平均接口偶极子与来自许多身体扰动理论的GW方法组合以计算半导体带边缘和占用1B $ _ {的质心之间的能级对准{ Mathrm {1}}美元的水平,因此电化学水平[2]。界面水解离程度和水合层的动态柔韧性影响水平对准。最后,在界面处存在质子和羟基影响孔定位。结果将讨论GaN,ZnO,以及TiO $ _ {Mathrm {2}} $的金红石和anatase形式。[1] N. Kharche等人,EXTIT {PHOME。化学。化学。 Phys。} 16,12057(2014)。[2] N. Kharche等人,EXTIT {PHOME。 rev. lett。} 113,176802(2014)。

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