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首页> 外文期刊>Scientific reports. >Driving ferromagnetic resonance frequency of FeCoB/PZN-PT multiferroic heterostructures to Ku-band via two-step climbing: composition gradient sputtering and magnetoelectric coupling
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Driving ferromagnetic resonance frequency of FeCoB/PZN-PT multiferroic heterostructures to Ku-band via two-step climbing: composition gradient sputtering and magnetoelectric coupling

机译:通过两步爬升将FeCoB / PZN-PT多铁异质结构的铁磁共振频率驱动到Ku带:成分梯度溅射和磁电耦合

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摘要

RF/microwave soft magnetic films (SMFs) are key materials for miniaturization and multifunctionalization of monolithic microwave integrated circuits (MMICs) and their components, which demand that the SMFs should have higher self-bias ferromagnetic resonance frequency f FMR, and can be fabricated in an IC compatible process. However, self-biased metallic SMFs working at X-band or higher frequency were rarely reported, even though there are urgent demands. In this paper, we report an IC compatible process with two-step superposition to prepare SMFs, where the FeCoB SMFs were deposited on (011) lead zinc niobate–lead titanate substrates using a composition gradient sputtering method. As a result, a giant magnetic anisotropy field of 1498?Oe, 1–2 orders of magnitude larger than that by conventional magnetic annealing method, and an ultrahigh f FMR of up to 12.96?GHz reaching Ku-band, were obtained at zero magnetic bias field in the as-deposited films. These ultrahigh microwave performances can be attributed to the superposition of two effects: uniaxial stress induced by composition gradient and magnetoelectric coupling. This two-step superposition method paves a way for SMFs to surpass X-band by two-step or multi-step, where a variety of magnetic anisotropy field enhancing methods can be cumulated together to get higher ferromagnetic resonance frequency.
机译:射频/微波软磁膜(SMF)是单片微波集成电路(MMIC)及其组件的小型化和多功能化的关键材料,要求SMF具有更高的自偏置铁磁谐振频率f FMR ,并且可以用IC兼容的工艺制造。但是,即使有迫切的需求,也很少报道工作于X波段或更高频率的自偏置金属SMF。在本文中,我们报告了通过两步叠加制备SMF的IC兼容工艺,其中,采用成分梯度溅射法将FeCoB SMF沉积在(011)铌酸铅锌-钛酸铅衬底上。结果,巨大的磁各向异性场达到1498?Oe,比常规磁退火方法大1–2个数量级,并且高达12.96?GHz的超高f FMR 到达Ku-在所沉积的膜中在零磁偏置场下获得能带。这些超高微波性能可归因于两种效应的叠加:成分梯度和磁电耦合引起的单轴应力。这种两步叠加方法为SMF分两步或多步铺平了X波段的道路,其中可以将各种磁各向异性场增强方法累加在一起以获得更高的铁磁共振频率。

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