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Novel aerobic tetracycline resistance gene that chemically modifies tetracycline.

机译:化学修饰四环素的新型有氧四环素抗性基因。

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A tetracycline resistance gene that was found originally on the Bacteroides plasmid pBF4 confers resistance on Escherichia coli but only when cells are growing aerobically. When E. coli EM24 carrying this aerobic tetracycline resistance (*Tcr) gene is grown in medium containing tetracycline, the resulting spent medium is no longer toxic to tetracycline-sensitive (Tcs) E. coli EM24 (B.S. Speer and A.A. Salyers, J. Bacteriol. 170: 1423-1429, 1988). To determine whether the *Tcr gene product modified tetracycline, we characterized the material resulting from incubation of E. coli (*Tcr) with tetracycline. When [7-3H(N)]tetracycline was added to cultures of E. coli (*Tcr), at least 90% of the label was recovered in the extracellular fluid. Therefore, tetracycline was not being sequestered by the cells. The labeled material behaved similarly to tetracycline with respect to solubility in various organic solvents. However, the UV-visible light spectrum had a single peak at 258 nm, whereas the tetracycline spectrum had a peak at 364 nm. The labeled material also had a faster migration rate than did tetracycline on thin-layer plates in a solvent system of butanol-methanol-10% citric acid (4:1:2, vol/vol/vol) and was separable from tetracycline by reverse-phase high-pressure liquid chromatography, using an acetronitrile-0.1% trifluoroacetic acid solvent system. These results demonstrate that the *Tcr gene product chemically modifies tetracycline. The *Tcr gene is the first example of a chemically modifying tetracycline resistance mechanism.
机译:最初在拟杆菌属质粒pBF4上发现的四环素抗性基因赋予了对大肠杆菌的抗性,但仅当细胞需氧生长时才具有抗性。当携带有氧四环素抗性(* Tcr)基因的大肠杆菌EM24在含有四环素的培养基中生长时,所得的用过的培养基不再对四环素敏感(Tcs)大肠杆菌EM24有毒(BS Speer和AA Salyers,J。 170:1423-1429,1988)。为了确定* Tcr基因产物是否修饰了四环素,我们表征了大肠杆菌(* Tcr)与四环素温育的物质。当将[7-3H(N)]四环素添加到大肠杆菌(* Tcr)培养物中时,至少90%的标记物在细胞外液中被回收。因此,四环素没有被细胞隔离。就在各种有机溶剂中的溶解度而言,标记材料的行为类似于四环素。但是,紫外可见光谱在258 nm处有一个峰,而四环素光谱在364 nm处有一个峰。在丁醇-甲醇-10%柠檬酸(4:1:2,体积/体积/体积)溶剂系统中,标记材料的迁移速率也比四环素薄板上的迁移速率快,并且可以通过反向分离与四环素分离高压液相色谱,使用乙腈-0.1%三氟乙酸溶剂体系。这些结果证明* Tcr基因产物化学修饰了四环素。 * Tcr基因是化学修饰四环素抗性机制的第一个例子。

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