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首页> 外文期刊>RSC Advances >Oxygen-vacancy-induced photoelectrochemical water oxidation by platelike tungsten oxide photoanodes prepared under acid-mediated hydrothermal treatment conditions
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Oxygen-vacancy-induced photoelectrochemical water oxidation by platelike tungsten oxide photoanodes prepared under acid-mediated hydrothermal treatment conditions

机译:酸介导的水热处理条件下制备的板状氧化钨光阳极的氧空位诱导的光电化学水氧化

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摘要

Introduction of oxygen vacancies in tungsten oxide photoanodes has been reported as an effective route towards enhancing the solar-driven water oxidation photocurrent. Therefore, it is reasonable to seek facile methods for controlling the number of oxygen vacancies in these photoanodes. Herein, a simple acid-mediated hydrothermal treatment method followed by calcination is utilized to fabricate tungsten oxide photoanodes. It is found that the variation of acid treatment temperature prior to calcination could influence the concentration of oxygen vacancies in the prepared platelike tungsten oxide photoanodes. These defects act as electron donors thus, they result in enhanced photoelectrochemical performance. Using XRD and Raman analyses, an insight is gained into the structure of the samples treated by acid-mediated hydrothermal method. Based on that, a correlation is made between the number of the intercalated water molecules in WO3·nH2O (n = 1 or 2) with the formation of oxygen vacancies during the calcination step. This finding is confirmed by XPS and Mott–Schottky analyses. At the optimum acid-mediated hydrothermal treatment temperature (75 °C), a photocurrent of 1.06 mA cm?2 at 1.23 V vs. RHE is obtained. This is six times larger than the photocurrent produced by the sample fabricated at a higher temperature of 175 °C. An IPCE of 36.2% is acquired for this sample under irradiation with 350 nm light and at an applied potential of 1.8 V vs. RHE. The IPCE of the optimum sample is three times higher than that of the sample treated at 175 °C. This indicates that the mild acid-mediated hydrothermal treatment enhances photocurrent and photoelectrochemical water oxidation performance due to the increased formation of beneficial oxygen vacancy defects.
机译:据报道,在氧化钨光阳极中引入氧空位是增强太阳能驱动的水氧化光电流的有效途径。因此,寻求控制这些光阳极中氧空位数量的简便方法是合理的。本文中,利用简单的酸介导的水热处理方法,然后煅烧来制造氧化钨光阳极。发现煅烧前酸处理温度的变化可能影响所制备的板状氧化钨光阳极中氧空位的浓度。这些缺陷充当电子给体,因此导致增强的光电化学性能。使用XRD和拉曼分析,可以深入了解通过酸介导的水热法处理的样品的结构。在此基础上,WO 3 · n H 2中嵌入水分子的数量之间存在相关性 O( n = 1或2)在煅烧步骤中形成氧空位。 XPS和Mott–Schottky分析证实了这一发现。在最佳的酸介导的水热处理温度(75°C)下,在1.23 V vs。 RHE下,光电流为1.06 mA cm ?2 。获得。这是在175°C的较高温度下制造的样品产生的光电流的六倍。在350 nm的光照射下,在1.8 V vs。 RHE的施加电势下,该样品的IPCE为36.2%。最佳样品的IPCE比在175°C下处理的样品高三倍。这表明由于增加了有益的氧空位缺陷的形成,温和的酸介导的水热处理增强了光电流和光电化学水的氧化性能。

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