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Investigation into Co and Ga2O3 co-doped ZnSe chalcogenide composite semiconductor thin films fabricated using PLD

机译:PLD法制备Co和Ga2O3共掺杂ZnSe硫族化物复合半导体薄膜的研究

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(Ga _(2) O _(3) ) _(0.1) (Co) _(0.5) (ZnSe) _(0.4) thin films were fabricated via PLD at different pressures and substrate temperatures. The influence of different preparation conditions on the thin films was deeply explored through investigating the structural, optical and electromagnetic properties, and surface morphologies. The thicknesses of the thin films were greatly affected by the preparation conditions. The poor light transmittance of the thin films under conditions of 4 Pa and 600 °C was revealed through refractive index measurements. The stable amorphous structure was confirmed via XRD. The optimum preparation conditions, room temperature, 800 °C and 10 Pa, were reflected in the transmission spectra. Greater energy transfer between each of the energy levels and more activity under the temperature conditions used were indicated through PL spectra. The lower resistivity and higher carrier concentration in the quartz substrate were shown in the results of Hall effect measurements. The significant impact of high temperature preparation conditions on the thin films was visualised using AFM. All of the results indicated that the properties of the thin films are significantly influenced by the preparation conditions. Furthermore, a semiconductor chalcogenide material with excellent optical and electromagnetic properties was proposed in this investigation.
机译:(Ga_(2)O_(3))_(0.1)(Co)_(0.5)(ZnSe)_(0.4)通过PLD在不同的压力和衬底温度下制造薄膜。通过研究结构,光学和电磁性能以及表面形态,深入研究了不同制备条件对薄膜的影响。薄膜的厚度受制备条件的影响很大。通过折射率测量揭示了在4Pa和600℃的条件下薄膜的差的透光率。通过XRD确认了稳定的无定形结构。透射光谱反映了最佳制备条件,即室温,800°C和10 Pa。通过PL光谱表明在所使用的温度条件下,每个能级之间的更大的能量传递和更多的活性。霍尔效应测量的结果显示出石英基板中较低的电阻率和较高的载流子浓度。使用AFM可以看到高温制备条件对薄膜的重大影响。所有结果表明,薄膜的性能受到制备条件的显着影响。此外,在该研究中提出了具有优异的光学和电磁性能的半导体硫族化物材料。

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