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Structural and electronic properties of hydrogenated GaBi and InBi honeycomb monolayers with point defects

机译:具有点缺陷的氢化GaBi和InBi蜂窝单层的结构和电子性质

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First-principles calculations are carried out to systematically investigate the structural and electronic properties of point defects in hydrogenated GaBi and InBi monolayers, including vacancies, antisites and Stone–Wales (SW) defects. Our results imply that the perfect H _(2) -Ga(In)Bi is a semiconductor with a bandgap of 0.241 eV (0.265 eV) at the Γ point. The system turns into a metal by introducing a Ga(In) vacancy, substituting a Bi with a Ga(In) atom or substituting an In with a Bi atom. Other defect configurations can tune the bandgap value in the range from 0.09 eV to 0.3 eV. In particular, the exchange of neighboring Ga(In) and Bi increases the bandgap, meanwhile the spin splitting effect is preserved. All SW defects decrease the bandgap. The lowest formation energy of defects occurs when substituting a Ga(In) with a Bi atom and the values of SW defects vary from 0.98 eV to 1.77 eV.
机译:进行第一性原理计算以系统地研究氢化GaBi和InBi单层中点缺陷的结构和电子性质,包括空位,反位点和Stone-Wales(SW)缺陷。我们的结果表明,理想的H _(2)-Ga(In)Bi是在Γ点的带隙为0.241 eV(0.265 eV)的半导体。该体系通过引入Ga(In)空位,用Ga(In)原子取代Bi或用Bi原子取代In来变成金属。其他缺陷配置可以在0.09 eV至0.3 eV的范围内调整带隙值。特别地,相邻的Ga(In)和Bi的交换增加了带隙,同时保留了自旋分裂效应。所有的SW缺陷都会减小带隙。当用Bi原子取代Ga(In)时,缺陷的形成能最低,SW缺陷的值在0.98 eV至1.77 eV之间变化。

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