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Molecular dynamics simulations of nanoscale engravings on an alkanethiol monolayer

机译:烷硫醇单层纳米雕刻的分子动力学模拟

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Nanoscale patterns engraved on the bulk monolayer of 1-decanethiol were examined using molecular dynamics simulations. The smallest widths required for stable circular and linear engravings were found to be 3.2 and 2.4?nm, respectively. The minimum separations possible without merging for circular and linear trenches were 2.0 and 2.6 nm, respectively. These values set the ultimate the size limit and spatial resolution for engraving the alkanethiol monolayer.
机译:使用分子动力学模拟检查了刻在1-癸硫醇本体单分子层上的纳米级图案。稳定的圆形和线性雕刻所需的最小宽度分别为3.2和2.4?nm。在不合并圆形和线性沟槽的情况下,最小间距分别为2.0和2.6 nm。这些值设置了雕刻烷硫醇单分子层的最终尺寸极限和空间分辨率。

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