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首页> 外文期刊>RSC Advances >Preparation and photoluminescence properties of yellow-emitting CuInS2/ZnS quantum dots embedded in TMAS-derived silica
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Preparation and photoluminescence properties of yellow-emitting CuInS2/ZnS quantum dots embedded in TMAS-derived silica

机译:嵌入TMAS的二氧化硅中发射黄光的CuInS 2 / ZnS量子点的制备及光致发光性能

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The degradation of CuInS2 (CIS) quantum dots (QDs) under excitation light due to photo-oxidization by O2 has been a significant problem. Embedding QDs into a matrix to protect them against O2 would improve their photostability. In this paper, hydrophilized CIS/ZnS/ZnS QDs prepared by a ligand exchange method were embedded in silica through a sol–gel method using tetramethylammonium silicate (TMAS) aqueous solution, in which negatively-charged nanoparticles can be well dispersed. QDs modified with 3-mercaptopropionic acid (MPA) were well dispersed into TMAS-derived silica. The obtained monolithic TMAS-derived silica composites containing embedded MPA-modified CIS/ZnS/ZnS QDs exhibited high photoluminescence (PL) quantum yields (43–47%). Changes in PL intensity under continuous excitation were measured to evaluate the photostability of the QDs. The PL intensity of the composite was 105% that of the initial value after 5 h irradiation, while the PL intensities of as-prepared QDs and a PMMA composite decreased to 88% and 92%, respectively. The good gas barrier properties of TMAS-derived silica likely caused the high photostability by preventing O2 from reaching the surface of the embedded QDs.
机译:O 2 上的激发光在CuInS 2 (CIS)量子点(QDs)的降解。 small>一直是一个重大问题。将QD嵌入矩阵以保护它们免受O 2 的侵害,可以提高其光稳定性。在本文中,通过使用配体交换法制备的亲水化CIS / ZnS / ZnS量子点,通过使用四甲基硅酸铵(TMAS)溶液的溶胶-凝胶法包埋在二氧化硅中,其中带负电荷的纳米粒子可以很好地分散。用3-巯基丙酸(MPA)修饰的QD很好地分散在TMAS衍生的二氧化硅中。获得的包含嵌入的MPA改性的CIS / ZnS / ZnS QD的单块TMAS衍生的二氧化硅复合材料表现出高的光致发光(PL)量子产率(43-47%)。测量连续激发下PL强度的变化,以评估QD的光稳定性。复合材料的PL强度为5 h辐照后的初始强度的105%,而制备的QD和PMMA复合材料的PL强度分别降至88%和92%。 TMAS衍生的二氧化硅具有良好的阻气性,可能通过阻止O 2 到达嵌入量子点的表面而导致高光稳定性。

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