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Two-photon controlled sol–gel condensation for the microfabrication of silica based microstructures. The role of photoacids and photobases

机译:两光子控制的溶胶-凝胶缩合,用于二氧化硅基微结构的微细加工。光酸和光碱的作用

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摘要

Two-photon excitation of photobases is used to induce pH changes and control the condensation step of the sol–gel process at the focal point of a laser beam in a confocal configuration. This two-photon microfabrication process, which is usually used in the polymerization of organic monomers, enables the generation of 2D and 3D inorganic Si–O–Si networks of silica based materials with micron resolution. Different variables for the formulation are studied, including the mechanism of condensation, the type of photo initiator, the solvent and the concentration used, as well as the laser parameters.
机译:光碱的双光子激发用于诱导pH值变化并控制共聚焦配置中激光束焦点处的溶胶-凝胶过程的冷凝步骤。这种双光子微细加工工艺通常用于有机单体的聚合反应,可以生成具有微米分辨率的二氧化硅基材料的2D和3D无机Si–O–Si网络。研究了配方的不同变量,包括缩合机理,光引发剂的类型,所用溶剂和浓度以及激光参数。

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