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High-performance n-type black phosphorus transistors with type control via thickness and contact-metal engineering

机译:高性能n型黑磷晶体管,可通过厚度和接触金属工程进行类型控制

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Recent work has demonstrated excellent p-type field-effect switching in exfoliated black phosphorus, but type control has remained elusive. Here, we report unipolar n-type black phosphorus transistors with switching polarity control via contact-metal engineering and flake thickness, combined with oxygen and moisture-free fabrication. With aluminium contacts to black phosphorus, a unipolar to ambipolar transition occurs as flake thickness increases from 3 to 13?nm. The 13-nm aluminium-contacted flake displays graphene-like symmetric hole and electron mobilities up to 950?cm2?V?1?s?1 at 300?K, while a 3?nm flake displays unipolar n-type switching with on/off ratios greater than 105 (107) and electron mobility of 275 (630)?cm2?V?1?s?1 at 300?K (80?K). For palladium contacts, p-type behaviour dominates in thick flakes, while 2.5–7?nm flakes have symmetric ambipolar transport. These results demonstrate a leap in n-type performance and exemplify the logical switching capabilities of black phosphorus.
机译:最近的研究表明,剥落的黑磷具有出色的p型场效应转换能力,但是类型控制仍然难以捉摸。在这里,我们报告了通过接触金属工程技术和薄片厚度控制开关极性的单极性n型黑磷晶体管,并结合了无氧和无湿的制造技术。当铝与黑磷接触时,随着薄片厚度从3nm增加到13?nm,会发生单极性到双极性的转变。 13nm铝接触薄片显示出石墨烯状的对称空穴,电子迁移率高达950?cm 2 ?V ?1 ?s ?1 在300?K时,而3?nm薄片则显示单极性n型开关,其开/关比大于10 5 (10 7 ),电子迁移率大于275(630)?cm 2 ?V ?1 ?s ?1 在300?K(80?K)下。对于钯触点,p型行为在较厚的薄片中占主导地位,而2.5–7nm的薄片具有对称的双极传输。这些结果证明了n型性能的飞跃,并例证了黑磷的逻辑开关能力。

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