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Deciphering Molecular Mechanisms of Interface Buildup and Stability in Porous Si/Eumelanin Hybrids

机译:Si / Eumelanin多孔杂种中界面建立和稳定性的分子机制研究

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Porous Si/eumelanin hybrids are a novel class of organic–inorganic hybrid materials that hold considerable promise for photovoltaic applications. Current progress toward device setup is, however, hindered by photocurrent stability issues, which require a detailed understanding of the mechanisms underlying the buildup and consolidation of the eumelanin–silicon interface. Herein we report an integrated experimental and computational study aimed at probing interface stability via surface modification and eumelanin manipulation, and at modeling the organic–inorganic interface via formation of a 5,6-dihydroxyindole (DHI) tetramer and its adhesion to silicon. The results indicated that mild silicon oxidation increases photocurrent stability via enhancement of the DHI–surface interaction, and that higher oxidation states in DHI oligomers create more favorable conditions for the efficient adhesion of growing eumelanin.
机译:Si / Eumelanin多孔杂化材料是一类新型的有机-无机杂化材料,在光伏应用中具有广阔的前景。然而,光电流稳定性问题阻碍了当前设备设置的进展,光电流稳定性问题要求对Eumelanin-硅界面的建立和巩固所基于的机制有详细的了解。本文中,我们报告了一项综合的实验和计算研究,旨在通过表面改性和Eumelanin处理来探测界面稳定性,并通过形成5,6-二羟基吲哚(DHI)四聚体及其对硅的粘附力来模拟有机-无机界面。结果表明,温和的硅氧化可通过增强DHI-表面相互作用来提高光电流稳定性,并且DHI低聚物中较高的氧化态为生长中的Eumelanin的有效粘附创造了更有利的条件。

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