Normalized Contact Force to Minimize “Electrode–Lead” Resistance in a Nanodevice

摘要

In this report, the contact resistance between “electrode” and “lead” is investigated for reasonable measurements of samples’ resistance in a polypyrrole (PPy) nanowire device. The sample’s resistance, including “electrode– lead” contact resistance, shows a decrease as force applied to the interface increases. Moreover, the sample’s resistance becomes reasonably similar to, or lower than, values calculated by resistivity of PPy reported in previous studies. The decrease of electrode–lead contact resistance by increasing the applying force was analyzed by using Holm theory: the general equation of relation between contact resistance (RH) of two-metal thin films and contact force ( ). The present investigation can guide a reliable way to minimize electrode–lead contact resistance for reasonable characterization of nanomaterials in a microelectrode device; 80% of the maximum applying force to the junction without deformation of the apparatus shows reasonable values without experimental error.