首页> 外文期刊>Bulletin of the Korean Chemical Society >Reaction of Triethylsilyl Radical with Sulfides, a Laser Falsh Photoylsis Study
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Reaction of Triethylsilyl Radical with Sulfides, a Laser Falsh Photoylsis Study

机译:三乙基甲硅烷基自由基与硫化物的反应,激光福莱斯光气化研究

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Triethylsilyl radical was generated by laser flash photolysis of a 1:1 (v/v)solution of triethylsliance and di-tert-butyl peroxide. The silicon centered radical was reacted with sulfides to give carbon centered radicals by displacement at sulfar. The carbon radicals were readily detected by their transient absorption spectra. The absolute rate of reaction of triethylsilyl radical with 9-fluorenylphenylsulfide, di-n-butylsulfide, di-sec-butyl, di-tert-butyl sulfide and di-n-butyl disulfide are 2.40【0.12オ 108 M-1s-1, 11.21【0.89オ106 M-1s-1, 8.79【 0.73オ106 M-1s-1, 3.29【0.18オ106 M-1s-1, 3.41【 0.09オ108 M-1s-1, respectively.
机译:三乙基硅酮和过氧化二叔丁基的1:1(v / v)溶液通过激光快速光解产生三乙基甲硅烷基。以硅为中心的自由基与硫化物反应,通过在硫磺中置换得到以碳为中心的自由基。碳自由基很容易通过其瞬态吸收光谱进行检测。三乙基甲硅烷基与9-芴基苯基硫醚,二正丁基硫醚,二仲丁基,二叔丁基硫醚和二正丁基二硫醚的绝对反应速率为2.40【0.12オ108 M-1s-1,分别为11.21【0.89オ106 M-1s-1,8.79【0.73オ106 M-1s-1,3.29【0.18オ106 M-1s-1,3.41【0.09オ108 M-1s-1。

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