首页> 外文期刊>Journal of the Korean Chemical Society >Simultaneous Determination of Zinc, Cadmium, Lead and Copper in Tungsten Matrix by Differential Pulse Anodic Stripping Voltammetry
【24h】

Simultaneous Determination of Zinc, Cadmium, Lead and Copper in Tungsten Matrix by Differential Pulse Anodic Stripping Voltammetry

机译:差分脉冲阳极溶出伏安法同时测定钨基体中锌镉镉铅铜

获取原文
           

摘要

The simultaneous determination of Zn, Cd, Pb and Cu in 1.000%(w/v) tungsten matrix by differential pulse anodic stripping voltammetry at a hanging mercury drop electrode has been studied. Tartaric acid(pH=5.00) was used as a supporting electrolyte. Optimum analytical conditions were found that the deposition potential was -1.2 volt(vs. Ag/AgCl), the deposition time was 3 minutes. The linear concentration range of all trace metal ions in 1.000%(w/v) tungsten matrix were 10 to 50 ppb. And the detection limit(3¥ò) of zinc, cadmium, lead and copper were 1.25, 1.02, 1.69, and 1.02 ppb respectively. This method was superior to the ICP-AES method which detection limits(3¥ò) in 1.000%(w/v) tungsten matrix were 8.0, 5.0, 120 and 5 ppb respectively.
机译:研究了在悬空汞滴电极上通过差分脉冲阳极溶出伏安法同时测定1.000%(w / v)钨基体中Zn,Cd,Pb和Cu的方法。酒石酸(pH = 5.00)用作支持电解质。发现最佳分析条件是沉积电位为-1.2伏特(vs. Ag / AgCl),沉积时间为3分钟。 1.000%(w / v)钨基体中所有痕量金属离子的线性浓度范围为10到50 ppb。锌,镉,铅和铜的检出限(3 ¥ò)分别为1.25、1.02、1.69和1.02 ppb。该方法优于ICP-AES方法,在1.0000%(w / v)钨基体中的检出限(3 ¥ò)分别为8.0、5.0、120和5 ppb。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号