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首页> 外文期刊>Journal of the Chilean Chemical Society >STRUCTURAL AND SEMICONDUCTING PROPERTIES OF ZnTe THIN FILMS GALVANOSTATICALLY GROWN ONTO MONOCRYSTALLINE InP SUBSTRATE FROM TeCL4 /DMSO SOLUTION
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STRUCTURAL AND SEMICONDUCTING PROPERTIES OF ZnTe THIN FILMS GALVANOSTATICALLY GROWN ONTO MONOCRYSTALLINE InP SUBSTRATE FROM TeCL4 /DMSO SOLUTION

机译:ZnTe薄膜的结构和半导电性质从TeCL4 / DMSO溶液中流电生长到单晶InP基质上

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ZnTe thin films were galvanostatically electrodeposited onto (100) InP substrates from an electrolytic solution containing TeCl4 dissolved in DMSO. Cyclic voltammetry in the dark was used to identify the process involved in the complex electrochemical reduction of the Te(IV) precursor. Quantitative analysis of energy dispersive x-ray analysis results indicated that the composition ratio (Zn:Te) was not possible to determine due the presence of a tellurium excess in the deposits. X-ray diffraction results revealed that the thin films obtained showed a preferred (200) orientation with cubic structure indicating the existence of an epitaxial grow along the (100) crysytalline planes of the InP substrate. The n-type character of the films was deduced from Mott-Schottky plots that also gave a donor density of 1.54 x 10+18 cnr-3. From the optical absortion measurements a bandgap of 2.21 eV was obtained.
机译:将ZnTe薄膜从含溶解在DMSO中的TeCl4的电解溶液中恒流电沉积到(100)InP基板上。在黑暗中使用循环伏安法来鉴定Te(IV)前体的复杂电化学还原过程。能量色散X射线分析结果的定量分析表明,由于沉积物中存在过量的碲,因此无法确定其组成比(Zn:Te)。 X射线衍射结果表明,所获得的薄膜显示具有立方结构的优选的(200)取向,表明存在沿InP衬底的(100)晶状体平面外延生长的存在。薄膜的n型特征是根据Mott-Schottky图得出的,该图还给出了1.54 x 10 + 18 cnr-3的供体密度。从光学吸收测量获得2.21eV的带隙。

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