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Analysis on Structural Stress of 64 × 64 InSb IRFPAs with Temperature Dependent Elastic Underfill

机译:随温度变化的弹性底部填充胶的64×64 InSb IRFPAs的结构应力分析

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To improve the reliability of InSb IRFPAs, underfill has usually been filled between InSb chip and Si ROIC. Around the glass transition temperature, underfill shows viscoelasticity, yet, far below it, which shows apparently temperature dependent mechanical properties. Basing on the temperature dependent elastic model of underfill, firstly a small format array of8×8elements InSb IRFPAs is investigated by changing indium bump diameters and heights; simulated results show that the maximum stress in InSb chip has nothing to do with underfill height and is dependent on indium bump diameter; the varying tendency is just like the horizontally extended letter U. When indium bump diameter is set to 24 μm with height 21 μm, the maximal stress in InSb chip reaches minimum. To learn the stress in64×64elements in short time, with the above optimal structure, InSb IRFPAs array scale is doubled once again from8×8to64×64elements. Simulation results show that the stress maximum in InSb chip is strongly determined by arrays format and increases with array scale; yet, the stress maximum in Si ROIC almost keeps constant and is independent on array sizes; besides, the largest stress locates in InSb chip, and the stress distribution in InSb chip is uniform.
机译:为了提高InSb IRFPA的可靠性,通常在InSb芯片和Si ROIC之间填充底部填充胶。在玻璃化转变温度附近,底部填充胶显示出粘弹性,但远低于其,这显然表现出与温度有关的机械性能。根据底部填充胶的温度相关弹性模型,首先通过改变铟凸点的直径和高度,研究一个8×8元素InSb IRFPA的小型阵列。仿真结果表明,InSb芯片的最大应力与底部填充高度无关,并取决于铟凸点直径。变化的趋势就像水平扩展的字母U。当铟凸点直径设置为24μm,高度为21μm时,InSb芯片中的最大应力达到最小。为了在短时间内了解64×64元素的应力,采用上述最佳结构,InSb IRFPAs阵列比例从8×8到64×64元素再次翻倍。仿真结果表明,InSb芯片的最大应力是由阵列格式决定的,并随阵列规模的增加而增大。然而,Si ROIC中的最大应力几乎保持恒定,并且与阵列尺寸无关。此外,最大应力集中在InSb芯片上,并且InSb芯片上的应力分布均匀。

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