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Effect of applied voltage and substrate preparation on surface modification of anodically oxidized titanium

机译:施加电压和基体制备对阳极氧化钛表面改性的影响

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In the present work, anodic oxidation (AO) treatment was used to modify surface ofcommercially-pure (CP) titanium. C.P-Ti ASTM grade 2 specimens, in two shapes of discand plate were prepared for this work. Disc titanium specimens were ground, polished andetched, while plate ones just etched. Afterwards anodic oxidation treatment performed inphosphoric acid electrolyte at 100, 200, and 300V. Crystalline structures of the substrateand grown films were evaluated using X-ray diffraction (XRD). Scanning electronmicroscopy (SEM) micrographs represented that by increasing the applied anodic voltage,the pore size increased, while the number of pores decreased. Energy-dispersive X-raySpectroscopy (EDS) analysis was performed to assay compositions of the prepared films.Roughness measurement of surface before and after anodic oxidation treatment indicatedthat etched plate samples had higher surface roughness than disc specimens. Moreoverroughness measurements represented that by applying higher voltage during anodicoxidation treatment, surface roughness increased due to arc-generation at high appliedvoltages, especially for those which anodized at 300V.
机译:在本工作中,阳极氧化(AO)处理用于修饰商业纯(CP)钛的表面。为这项工作准备了C.P-Ti ASTM 2级标本,呈圆盘状两种形状。将圆盘钛试样研磨,抛光和蚀刻,而将平板试样蚀刻。然后,在100、200和300V下在磷酸电解质中进行阳极氧化处理。使用X射线衍射(XRD)评估基材和生长膜的晶体结构。扫描电子显微镜(SEM)显微照片表明,通过增加施加的阳极电压,孔尺寸增加,而孔数量减少。进行了能量色散X射线能谱(EDS)分析以测定所制备膜的组成。阳极氧化处理前后的表面粗糙度测量表明,蚀刻后的板样品的表面粗糙度高于圆盘样品。粗糙度测量表明,通过在阳极氧化处理期间施加更高的电压,由于在高施加电压下产生电弧,表面粗糙度增加,尤其是对于在300V时进行阳极氧化的表面。

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