首页> 外文期刊>Journal of Optoelectronics Engineering >Analysis of Strained Al0.15In0.22Ga0.63As/GaAs Graded Index–Separate Confinement Lasing Nano-heterostructure
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Analysis of Strained Al0.15In0.22Ga0.63As/GaAs Graded Index–Separate Confinement Lasing Nano-heterostructure

机译:应变Al0.15In0.22Ga0.63As / GaAs梯度指数-分隔约束激光纳米异质结构的分析

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The paper deals with a theoretical insight into the various characteristics of a 0.89 μm Al0.15In0.22Ga0.63As/GaAs strained single quantum well based Graded Index (GRIN) - separate confinement lasing nano-heterostructure. Major emphasis has been laid on the optical and modal gain. Both these gain have been simulated with respect to lasing wavelength, photon energy and current density. In this paper, we have also drawn a comparative picture of the two polarization modes i.e Transverse Electric (TE) and Transverse Magnetic (TM). The maximum optical gain has been observed to be 5557.18 cm-1 at the lasing wavelength ~ 0.90 μm and photonic energy ~ 1.36 eV in TE mode and it is only 2760.70 cm-1 at the lasing wavelength ~ 0.78 μm and at photonic energy ~ 1.58 eV in TM mode. However, the maximum modal gain has been observed to be 54.65 cm-1 in TE mode and it is 27.16 cm-1 in TM mode at the same lasing wavelengths and photonic energies respectively at 298 K. The behavior of quasi Fermi levels for the conduction band and valence band has also been studied. Other important parameters like gain compression, differential gain and refractive index profile have also been simulated with respect to carrier density. Anti-guiding factor has been plotted against current density to observe its behavior in order to support the explanation of optical gain simulated.
机译:本文对0.89μmAl0.15In0.22Ga0.63As / GaAs应变单量子阱基于梯度指数(GRIN)-分离约束激光纳米异质结构的各种特征进行了理论分析。主要重点是光学和模态增益。这些增益都针对激光波长,光子能量和电流密度进行了仿真。在本文中,我们还绘制了两种极化模式的比较图,即横向电(TE)和横向磁(TM)。在TE模式下,在激光波长〜0.90μm和光子能量〜1.36 eV处观察到最大光增益为5557.18 cm-1,在激光波长〜0.78μm和光子能量〜1.58时最大光学增益仅为2760.70 cm-1。 TM模式下的eV。然而,在相同的激光波长和光子能量下,在298 K下,在TE模式下的最大模态增益为54.65 cm-1,在TM模式下为27.16 cm-1。准费米能级的行为价带和价带也已被研究。还已经针对载流子密度模拟了其他重要参数,例如增益压缩,差分增益和折射率分布。已针对电流密度绘制了抗引导因子,以观察其行为,以支持对模拟光学增益的解释。

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