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Self–diffusion of water molecules confined between quartz surfaces at elevated temperatures by molecular dynamics simulations

机译:通过分子动力学模拟,限制了高温下限制在石英表面之间的水分子的自扩散

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Molecular dynamics (MD) simulations were performed to investigate the self–diffusion coefficients and density profiles of water confined between quartz (1010) surfaces at 298–573 K. The self–diffusion coefficient of water near the surface was lower than that of water far from the surface. The density profiles of H_(2)O molecules showed several layered structures near the surface. In the thickness of 4.8 nm of H_(2)O at 298 K, the thickness of layered structure was estimate to be 1.0 nm, and the self–diffusion coefficient was reduced in 1.0 nm distance from the surface. At 573 K, the thickness of reducing area could be larger than the thickness of layered structure of 1.5 nm. Even in higher temperature conditions such as 573 K, the self–diffusion coefficient of water near the surface was reduced.
机译:进行了分子动力学(MD)模拟,研究了在298–573 K范围内被限制在石英(1010)表面之间的水的自扩散系数和密度分布。表层附近水的自扩散系数低于远处水的自扩散系数从表面。 H_(2)O分子的密度分布在表面附近显示出几层结构。在298 K的H_(2)O厚度为4.8 nm时,层状结构的厚度估计为1.0 nm,并且自扩散系数在距表面1.0 nm处减小。在573 K时,还原区的厚度可能大于1.5 nm的层状结构的厚度。即使在诸如573 K的高温条件下,地表附近水的自扩散系数也会降低。

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