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首页> 外文期刊>Journal of Mining and Metallurgy, Section B: Metallurgy >Microstructural investigation of the coatings prepared by simultaneous aluminizing and siliconizing process on γ-TiAl
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Microstructural investigation of the coatings prepared by simultaneous aluminizing and siliconizing process on γ-TiAl

机译:γ-TiAl同时渗铝和硅化工艺制备的涂层的显微组织研究

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In this research, formation of aluminide/silicide diffusion coatings on γ-TiAl[Ti-48Al-2Nb–2Cr (at.%)] alloy using gasphase diffusion pack cementation process has been investigated. The application of powder mixtures with various chemical compositions in the pack cementation process performed at 1000oC for 6 hours in order to achieve simultaneous diffusion of Al and Si, showed that the composition of the powder mixture could have a significant effect on the structure and thickness of the aluminide/silicide coatings. The identification and analysis of aluminide/silicide microstructures formed as a result of simultaneous diffusion of Al and Si, which was comprehensively and qualitatively done for the first time in this study, showed that the sequential mechanism is dominant in the formation of the above-mentioned coatings. Furthermore, Kirkendall phenomenon and volumetric changes caused by the formation of Ti5Si3 and Ti5Si4, were considered as the two dominant mechanisms in the formation of porous segregated structure in these coatings. In this study, the effect of decreasing the activity of Si, through two approaches of reducing the amount of Si in the powder mixture and using Al- 20wt.%Si alloyed powder instead of pure Al and Si depositing elements, on the microstructural modification coatings was investigated. The results showed that reducing the Si activity at the surface of the coating and, consequently, reducing the flux of active silicon atoms (JSi), has a significant effect on the formation of coating with an ideal structure.
机译:在这项研究中,已经研究了采用气相扩散包胶结法在γ-TiAl[Ti-48Al-2Nb–2Cr(at。%)]合金上形成铝化物/硅化物扩散涂层的方法。为了实现Al和Si的同时扩散,在1000°C下进行了6小时的充填胶结工艺,使用了具有各种化学成分的粉末混合物,这表明粉末混合物的组成可能对铝的结构和厚度产生重大影响。铝化物/硅化物涂层。铝和硅的同时扩散形成的铝化物/硅化物微观结构的鉴定和分析是本研究中首次进行的综合和定性研究,表明顺序机制是上述形成的主导因素涂料。此外,认为Ti5Si3和Ti5Si4的形成引起的Kirkendall现象和体积变化是这些涂层中形成多孔偏析结构的两个主要机理。在这项研究中,通过减少粉末混合物中的硅含量并使用Al-20wt。%Si合金粉末代替纯Al和Si沉积元素的两种方法,在微结构改性涂层上降低了Si的活性。被调查了。结果表明,降低涂层表面的Si活性,从而降低活性硅原子(JSi)的通量,对形成具有理想结构的涂层具有重大影响。

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