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首页> 外文期刊>Journal of Materials Research and Technology >Confirmation of spatial coexistence of magneto-electric coupling in Bi 0.7Dy 0.3FeO 3 thin films integrated with Si/ZnO film for MEMS and memory applications
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Confirmation of spatial coexistence of magneto-electric coupling in Bi 0.7Dy 0.3FeO 3 thin films integrated with Si/ZnO film for MEMS and memory applications

机译:在Bi 0.7 Dy 0.3 FeO 3 与Si / ZnO薄膜集成的薄膜,用于MEMS和存储器应用

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摘要

Spatial presence of ferroelectric and magnetic domain structure of the multiferroic dysprosium (Dy)-modified BiFeO3(Bi0.7Dy0.3FeO3or BDFO) deposited on ZnO at the macroscopic level is investigated in this paper. BDFO thin film is deposited on Si/ZnO using pulsed laser deposition (PLD) technique. Magnetic properties are observed by saturated magnetic hysteresis at room temperature. Ferroelectric hysteresis loop (P–E) is used to compare the response of magnetic field on ferroelectric properties at room temperature of BDFO and BDFO/ZnO thin films. The changes in ferroelectric hysteresis loops with magnetic field ensures about the magnetoelectric (M–E) coupling in BDFO/ZnO films. A well-saturated ferroelectric hysteresis loop with remarkable improvement in remanent polarization (~1.72μC/cm2) is observed. The obtained results confirm the coexistence of ferromagnetic and ferroelectric ordering with significant coupling at room temperature. The coupling behavior and magnetic transition are also verified using multimode atomic force microscope by applying bias between sample and MFM tip. The leakage current density is measured in the order of 10?5A/cm2. Integration of BDFO films with ZnO piezoelectric thin film suggests in principle its potential in applications of micro electro mechanical systems (MEMS) as well as in memory devices and in strong history dependent systems.
机译:本文从宏观角度研究了多铁ic(Dy)修饰的BiFeO3(Bi0.7Dy0.3FeO3或BDFO)沉积在ZnO上的铁电和磁畴结构的空间存在。使用脉冲激光沉积(PLD)技术将BDFO薄膜沉积在Si / ZnO上。在室温下通过饱和磁滞观察磁性。铁电磁滞回线(PE)用于比较BDFO和BDFO / ZnO薄膜在室温下磁场对铁电性能的响应。铁电磁滞回线随磁场的变化可确保BDFO / ZnO薄膜中的磁电(M–E)耦合。观察到饱和铁电磁滞回线的饱和度显着提高,剩余极化度(〜1.72μC/ cm2)显着提高。获得的结果证实了铁磁和铁电有序的并存,在室温下具有显着的耦合。通过使用样品和MFM尖端之间的偏压,还可以使用多模原子力显微镜验证耦合行为和磁跃迁。泄漏电流密度的测量范围为10-5A / cm2。 BDFO膜与ZnO压电薄膜的集成原则上表明了其在微机电系统(MEMS)的应用,存储设备以及与历史相关的系统中的潜力。

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