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Structural, morphological, optical, and gas sensing characteristics of ultraviolet-assisted photoelectrochemical etching derived AlInGaN nano-spikes

机译:紫外线辅助光电化学蚀刻衍生的AlInGaN纳米钉的结构,形态,光学和气体传感特性

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The formation of nano-dendritic like structure and nano-spikes in AlInGaN films via ultraviolet-assisted photoelectrochemical (PEC) etching at different current densities (5, 20, and 40mA/cm2) could be potentially deployed as the hydrogen sensor. The ability of nano-dendritic like structure and nano-spikes to provide large surface area to volume ratio could improve hydrogen (H) adsorption in the AlInGaN films, and thereby offering a greater sensitivity as compared to the as-grown film. The film subjected to PEC etching at 40mA/cm2has demonstrated the highest sensitivity (79.6%), followed by that subjected to PEC etching at 20 and 5mA/cm2. The acquisition of the highest sensitivity in the aforementioned film suggested that nano-spikes (40mA/cm2) surpassed nano-dendritic like structures (5 and 20mA/cm2) in term of providing larger surface area to volume ratio for H adsorption. Moreover, the largest total dislocation density present in the nano-spikes film could be the reason contributing to the increased gas sensitivity because the dislocation could serve as the trapping sites to mediate the diffusion of the adsorbed H, and thus facilitating the H detection. As a result, a fast response time (105s) and recovery time (46s) was obtained.
机译:通过在不同电流密度(5、20和40mA / cm2)下通过紫外线辅助光电化学(PEC)蚀刻在AlInGaN薄膜中形成纳米树突状结构和纳米尖峰,有可能被用作氢传感器。纳米树突状结构和纳米尖峰提供大的表面积与体积之比的能力可以改善AlInGaN膜中的氢(H)吸附,从而与生长的膜相比具有更高的灵敏度。在40mA / cm2下进行PEC蚀刻的膜具有最高的灵敏度(79.6%),其次是在20mA和5mA / cm2下进行PEC蚀刻的膜。在上述膜中获得最高灵敏度表明,在为H吸附提供更大的表面积/体积比方面,纳米钉(40mA / cm2)超过了纳米树枝状结构(5和20mA / cm2)。此外,存在于纳米钉膜中的最大总位错密度可能是增加气体敏感性的原因,因为该位错可用作介导吸附的H扩散的俘获位点,从而促进了H的检测。结果,获得了快速的响应时间(105s)和恢复时间(46s)。

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