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UV-laser Treatment in the Nanodomain: Forming of Organic Nanofibers

机译:纳米域中的紫外激光治疗:有机纳米纤维的形成

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Nanofibers grown in a sophisticated surface self assembly process from organic molecules are important key elements for future nanoscaled optoelectronic devices. They might serve both as pas- sive elements such as waveguides and as active elements such as nanoscaled light sources or nanolasers. For both applications, structuring of the nanofibers by defined cutting is very important. However, as with all surface grown nanoaggregates, this is a difficult task when applying conven- tional mechanical cutting methods. In this article we show that excimer laser treatment at 193 nm provides a valuable alternative. We find that irradiation at a fluence of 100 mJ/cm 2 removes the fi- bers completely without damaging the growth substrate mica. In addition, the fibers can be cut in any orientation relative to their long axes. Ablation and cutting work even better for nanofibers transferred onto other substrate surfaces such as glass. We investigate the quality of the ablation process in terms of nanofiber bleaching, substrate destruction and steepness of cutting by atomic force as well as fluorescence microscopy. It is shown that the imaging focus position has a critical influence on the steepness, with a so far limiting value of 400 nm.
机译:由有机分子以复杂的表面自组装过程生长的纳米纤维是未来纳米级光电器件的重要关键元素。它们既可以用作波导等有源元件,也可以用作纳米级光源或纳米激光等有源元件。对于这两种应用,通过定义的切割对纳米纤维进行结构化非常重要。但是,与所有表面生长的纳米聚集体一样,在应用常规机械切割方法时,这是一项艰巨的任务。在本文中,我们证明了在193 nm处进行准分子激光处理是一种有价值的选择。我们发现以100 mJ / cm 2的能量密度辐照可以完全去除纤维,而不会损坏生长基质云母。另外,纤维可以相对于其长轴以任何取向被切割。对于转移到其他基材表面(例如玻璃)上的纳米纤维,烧蚀和切割效果更好。我们从纳米纤维漂白,基材破坏和原子力切割的陡度以及荧光显微镜等方面研究了烧蚀工艺的质量。结果表明,成像焦点位置对陡度具有关键影响,到目前为止极限值为400 nm。

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