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首页> 外文期刊>Journal of Electrical Engineering >Temperature dependence of photoluminescence peaks of porous silicon structures
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Temperature dependence of photoluminescence peaks of porous silicon structures

机译:多孔硅结构的光致发光峰的温度依赖性

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Abstract>Evaluation of photoluminescence spectra of porous silicon (PS) samples prepared by electrochemical etching is presented. The samples were measured at temperatures 30, 70 and 150 K. Peak parameters (energy, intensity and width) were calculated. The PL spectrum was approximated by a set of Gaussian peaks. Their parameters were fixed using fitting a procedure in which the optimal number of peeks included into the model was estimated using the residuum of the approximation. The weak thermal dependence of the spectra indicates the strong influence of active defects.
机译:摘要 >介绍了通过电化学刻蚀制备的多孔硅(PS)样品的光致发光光谱。在30、70和150 K的温度下测量样品。计算峰参数(能量,强度和宽度)。 PL谱由一组高斯峰近似。使用适合的过程固定其参数,其中使用近似值估计模型中包含的最佳偷看次数。光谱的热依赖性弱表明活性缺陷的影响很大。

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