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首页> 外文期刊>Journal of arrhythmia. >Variations in cephalic vein venography for device implantation–Relationship to success rate of lead implantation
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Variations in cephalic vein venography for device implantation–Relationship to success rate of lead implantation

机译:装置植入时头静脉静脉造影的变化-与铅植入成功率的关系

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IntroductionLead implantation using the cephalic vein (CV) cutdown technique has been well established, but is not always expected to achieve high success rates. We studied the relationship between preoperative CV venography and the success rate of lead implantation.MethodsTwo hundred and twenty one CV venographies were performed in 205 patients (mean age 75 years, 113 males). Leads were inserted via the CV cutdown technique with a guidewire and sheath. Variations in CV venography included usage of the right and left CVs. The success rate of lead implantation was studied.ResultsNo major kink was observed in 71% of the right CV cases and 43% of the left CV cases. Leads were successfully implanted in over 90% of these patients. A major kink in the CV was found in 15% of the right CV cases and 34% of the left CV cases and successful lead implantation was around 80% in this population. The overall success rate tended to be higher for the right side (83%) than for the left side (71%).ConclusionSevere kinks or variations in the CV that hinder lead manipulation were less frequent in the right CV. Therefore, a higher success rate of lead implantation by the cutdown technique is expected for the right CV.
机译:简介使用头颈静脉(CV)切除技术进行的铅植入术已经很成熟,但并不总是能够获得很高的成功率。方法:对205例患者(平均年龄75岁,男113例)进行了221次CV静脉造影。通过带有导线和护套的CV截止技术插入导线。简历静脉造影的变化包括左右简历的用法。结果:在71%的右CV病例和43%的左CV病例中未观察到大的扭结。超过90%的患者成功植入了导线。在15%的右CV病例和34%的左CV病例中发现了CV的主要纽结,并且该人群中成功的铅植入约为80%。总体上,右侧(83%)的成功率往往高于左侧(71%)。结论严重的扭结或CV变差会妨碍引线操作,在右侧CV中的发生率较低。因此,对于正确的CV而言,期望通过降低技术实现铅植入的成功率更高。

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