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Deterministic measurement and correction of the pad shape in full-aperture polishing processes

机译:确定性地测量和校正全口径抛光工艺中的抛光垫形状

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Full-aperture polishing is a significant process in fabricating large optical flats because it restrains Mid-Spatial Frequency errors and removes material quickly on the whole optic surface. Nevertheless, optical flats fabricated by full-aperture polishing generally fail to meet the stringent requirement of surface figure, which has to be corrected by sub-aperture polishing processes. Surface figure of optical flats in full-aperture polishing processes is primarily dependent on the pressure distribution uniformity which correlates intensively with the lap shape. At present, practical and precise means are urgently desired for measuring and correcting the lap shape, especially the polyurethane pad lap. In the study, we present a novel method for deterministic measurement of the pad shape. The method obtains the height of the pad at spirally distributed locations implemented by the revolution of the pad and translation of the laser displacement sensor. The pad shape in terms of matrixes whose elements representing the heights at the corresponding locations is then calculated by interpolation algorithm based on the obtained data. Further, we propose a method for deterministic correction of the pad shape utilizing a small conditioning tool. The dwell time algorithm and implementation strategy for the dwell time are provided for common full-aperture polishers. These solutions for the deterministic measurement and correction of the pad shape have been validated on a full-aperture polisher with polyurethane pad. The polishing experiments revealed that the optic surface figure was obviously improved.
机译:全孔径抛光是制造大型光学平面的重要过程,因为它可以抑制中空频率误差并快速去除整个光学表面上的材料。然而,通过全光圈抛光制造的光学平板通常不能满足表面形状的严格要求,必须通过亚光圈抛光工艺对其进行校正。全孔径抛光过程中光学平板的表面形状主要取决于压力分布均匀性,而压力分布均匀性与搭接形状密切相关。当前,迫切需要实用且精确的手段来测量和校正棉卷形状,特别是聚氨酯垫的棉卷。在研究中,我们提出了一种确定性测量垫形状的新方法。该方法在垫的旋转和激光位移传感器的平移实现的螺旋分布位置处获得垫的高度。然后,基于所获得的数据,通过插值算法,以矩阵为单位的垫形状,该矩阵的元素表示相应位置处的高度。此外,我们提出了一种使用小型调节工具进行垫形确定性校正的方法。为普通的全光圈抛光机提供了停留时间算法和停留时间的实现策略。这些用于确定性测量和校正抛光垫形状的解决方案已在带有聚氨酯抛光垫的全孔径抛光机上得到验证。抛光实验表明,光学表面图形明显改善。

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