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首页> 外文期刊>Transactions of the Japan Society for Computational Engineering and Science >In Situ Observation of Magnetic Anisotropy Energy of Alternately Layered FeNi Thin Films
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In Situ Observation of Magnetic Anisotropy Energy of Alternately Layered FeNi Thin Films

机译:交替层叠的FeNi薄膜的磁各向异性能的原位观察

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Magnetic anisotropy of alternately layered FeNi thin films grown on Ni(3--21 ML)/Cu(001) is investigated by means of the X-ray magnetic circular dichroism (XMCD). Perpendicular magnetic anisotropy is observed when the substrate Ni is thicker than 15 and 20 ML for 4 and 6 ML FeNi films, respectively, while in-plane magnetic anisotropy appears at the thinner substrate Ni region. By comparing with the magnetic phase diagram calculated from the magnetic anisotropy energies, which are obtained by the XMCD study [M. Sakamaki and K. Amemiya, Appl. Phys. Express 4, 073002 (2011)], we show that the phase boundary of the present samples shifts so as to prefer the in-plane magnetic anisotropy. This might be caused by the structural relaxation in the substrate Ni. [DOI: 10.1380/ejssnt.2012.97]
机译:利用X射线磁性圆二色性(XMCD)研究了在Ni(3--21 ML)/ Cu(001)上生长的交替层叠的FeNi薄膜的磁各向异性。当基板Ni分别大于4和6 ML FeNi膜的15和20 ML时,观察到垂直的磁各向异性,而在较薄的基板Ni区域出现面内磁各向异性。通过与由XMCD研究获得的磁各向异性能计算出的磁相图进行比较[M. Sakamaki和K. Amemiya,应用物理Express 4,073002(2011)],我们表明当前样本的相界发生了偏移,从而偏爱面内磁各向异性。这可能是由于衬底Ni中的结构松弛所致。 [DOI:10.1380 / ejssnt.2012.97]

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