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首页> 外文期刊>Transactions of the Japan Society for Computational Engineering and Science >Development of a Simple Probe for Non-Destructive Reversible Electric Contact to nm-Thick Films and 2D Films
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Development of a Simple Probe for Non-Destructive Reversible Electric Contact to nm-Thick Films and 2D Films

机译:纳米厚膜和2D膜无损可逆电接触的简单探针的开发

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A simple probe that is applicable as an electric contact to nm-thick films and 2D films such as graphene and MoS2 without destroying the specimen has been developed. The concept of the development of the probe is based on the repulsive region used in atomic force microscopy technique but without any precise feedback. The robust electric contact with the probe has been demonstrated by biased XPS measurement of a MOS specimen and by resistivity measurement of a 5-layer graphene film on sapphire. It has also proved that there was no detectable damage or contaminations on the specimens after the measurements. [DOI: 10.1380/ejssnt.2015.307]
机译:已经开发出一种简单的探针,该探针可与纳米厚度的薄膜和2D薄膜(如石墨烯和MoS2)进行电接触而不会破坏样品。探头开发的概念基于原子力显微镜技术中使用的排斥区域,但没有任何精确的反馈。通过偏置XPS测量MOS样品以及通过测量蓝宝石上的5层石墨烯膜的电阻率,可以证明与探头的牢固电接触。还证明了在测量之后样品上没有可检测到的损坏或污染。 [DOI:10.1380 / ejssnt.2015.307]

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