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Application of the laser pulse method of measuring thermal diffusivity to thin alumina and silicon samples in a wide temperature range

机译:激光脉冲法在宽温度范围内测量热扩散率在薄氧化铝和硅样品上的应用

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Paper presents results of measuring thermal diffusivity of translucent or partially transparent thin discs of non-metals such as alumina and silicon using most widely spread experimental technique, the standard laser pulse method. Difficulties in its application to such materials are discussed. The thermal diffusivity has been measured from room temperature up to 900°C for alumina, and to 1200°C for silicon. Obtained results are analyzed and compared with available literature data and existing recommended functions.
机译:本文介绍了使用最广泛使用的实验技术(标准激光脉冲法)测量半透明或部分透明的非金属(例如氧化铝和硅)薄盘的热扩散率的结果。讨论了将其应用于此类材料的困难。已测量了从室温到氧化铝的最高900°C和到硅的1200°C的热扩散率。分析获得的结果,并将其与可用的文献数据和现有的推荐功能进行比较。

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