Synthesis and Characterization of Ruthenium Amidinate Complexes asPrecursors for Vapor Deposition

摘要

Three new ruthenium amidinate complexes were prepared: tris(diisopropylacetamidinato)-ruthenium(III),Ru(iPrNC(Me)NiPr)3 4; bis(diisopropyl-acetamidinato)ruthenium(II) dicarbonyl, Ru(iPrNC(Me)NiPr)2(CO)2 5; and bis(ditert-butylacetamidinato)ruthenium(II) dicarbonyl, Ru(tBuNC(Me)NtBu)2(CO)2 6. They have been synthesized and characterizedby 1H NMR, TG and X-ray structure analysis. These three complexes were found to be monomeric and air stable.Compound 6 was found to have sufficient volatility and thermal stability for use in chemical vapor deposition (CVD) andatomic layer deposition (ALD) of ruthenium metal films.