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Dynamics of hydrogen in hydrogenated amorphous silicon

机译:氢化非晶硅中氢的动力学

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The problem of hydrogen diffusion in hydrogenated amorphous silicon (a-Si:H) is studied semiclassically. It is found that the local hydrogen concentration ???uctuations-induced extra potential wells, if intense enough, lead to the localized electronic states in a-Si:H. These localized states are metastable. The trapping of electrons and holes in these states leads to the electrical degradation of the material. These states also act as recombination centers for photo-generated carriers (electrons and holes) which in turn may excite a hydrogen atom from a nearby Sia€“H bond and breaks the weak (strained) Sia€“Si bond thereby apparently enhancing the hydrogen diffusion and increasing the light-induced dangling bonds.
机译:半经典研究了氢在氢化非晶硅(a-Si:H)中的扩散问题。已经发现,局部氢浓度的诱变引起的额外势阱,如果强度足够大,会导致α-Si:H中的局部电子态。这些局部状态是亚稳态的。在这些状态下电子和空穴的俘获导致材料的电降解。这些状态还充当光生载流子(电子和空穴)的复合中心,这些载流子又可能从附近的Sia-H键激发氢原子并破坏弱的(应变的)Sia-Si键,从而明显增强了氢扩散并增加光诱导的悬空键。

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