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Extreme regimes of femtosecond photoemission from a copper cathode in a dc electron gun

机译:直流电子枪中来自铜阴极的飞秒光发射的极端机制

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The femtosecond photoemission yield from a copper cathode and the emittance of the created electron beams has been studied in a $12ext{ }ext{ }mathrm{MeV}/mathrm{m}$, 100 keV dc electron gun over a wide range of laser fluence, from the linear photoemission regime until the onset of image charge limitations and cathode damaging. The measured photoemission curves can be described well with available theory which includes the Schottky effect, second-order photoemission, and image charge limitation. The second-order photoemission can be explained by thermally assisted one-photon photoemission (1PPE) and by above-threshold two-photon photoemission (2PPE). Measurements with a fresh cathode suggest that the 2PPE process is dominant. The beam emittance has been measured for the entire range of initial surface charge densities as well. The emittance measurements of space-charge dominated beams can be described well by an envelope equation with generalized perveance. The dc gun produces 0.1 pC bunches with 25 nm rms normalized emittance, corresponding to a normalized brightness usually associated with rf photoguns. In this experimental study the limits of femtosecond photoemission from a copper cathode have been explored and analyzed in great detail, resulting in improved understanding of the underlying mechanisms.
机译:飞秒从铜阴极飞秒的光发射量和产生的电子束的发射率已经在$ 12 text {} text {} mathrm {MeV} / mathrm {m} $,100 keV直流电子枪上进行了研究。从线性光发射方案到开始出现图像电荷限制和阴极损坏,激光注量范围广。可以使用包括肖特基效应,二次光发射和图像电荷限制在内的可用理论很好地描述测得的光发射曲线。二次光发射可以通过热辅助单光子光发射(1PPE)和阈值以上的双光子光发射(2PPE)来解释。用新鲜阴极进行的测量表明2PPE工艺占主导地位。还已经针对初始表面电荷密度的整个范围测量了光束发射率。空间电荷主导的光束的发射率测量可以很好地通过具有广义导数的包络方程来描述。直流电枪产生0.1 pC束,具有25 nm rms的归一化发射率,对应于通常与RF光电枪相关的归一化亮度。在这项实验研究中,已经对铜阴极飞秒光发射的极限进行了详细的研究和分析,从而提高了对潜在机理的理解。

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