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Sideband instability analysis based on a one-dimensional high-gain free electron laser model

机译:基于一维高增益自由电子激光模型的边带不稳定性分析

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When an untapered high-gain free electron laser (FEL) reaches saturation, the exponential growth ceases and the radiation power starts to oscillate about an equilibrium. The FEL radiation power or efficiency can be increased by undulator tapering. For a high-gain tapered FEL, although the power is enhanced after the first saturation, it is known that there is a so-called second saturation where the FEL power growth stops even with a tapered undulator system. The sideband instability is one of the primary reasons leading to this second saturation. In this paper, we provide a quantitative analysis on how the gradient of undulator tapering can mitigate the sideband growth. The study is carried out semianalytically and compared with one-dimensional numerical simulations. The physical parameters are taken from Linac Coherent Light Source-like electron bunch and undulator systems. The sideband field gain and the evolution of the radiation spectra for different gradients of undulator tapering are examined. It is found that a strong undulator tapering ($ensuremath{sim}10%$) provides effective suppression of the sideband instability in the postsaturation regime.
机译:当无锥度的高增益自由电子激光(FEL)达到饱和时,指数增长停止,辐射功率开始在平衡附近振荡。 FEL辐射功率或效率可以通过起伏器逐渐变细来提高。对于高增益锥形FEL,尽管在第一次饱和后功率有所提高,但是众所周知,即使使用锥形波动系统,也存在所谓的第二饱和,其中FEL功率停止增长。边带不稳定性是导致第二饱和的主要原因之一。在本文中,我们对起伏器逐渐变细的梯度如何减轻边带增长提供了定量分析。该研究是半解析地进行的,并与一维数值模拟进行了比较。物理参数来自类似直线加速器相干光源的电子束和波荡器系统。考察了边带场增益和波动梯度逐渐减小的不同梯度辐射谱的变化。已经发现,强大的起伏逐渐变细($ ensuremath { sim} 10%$)可有效抑制后饱和状态下的边带不稳定性。

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