Influence of oxygen partial pressure and annealing on magnetic properties of Al -doped ZnO thin films

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Influence of oxygen partial pressure and annealing on magnetic properties of Al -doped ZnO thin films

机译：氧分压和退火对掺铝ZnO薄膜磁性能的影响

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AldopedZnOfilmshavebeenpreparedusingdifferentAr:O2ratiosandannealingconditionsonglasssubstratesbydcreactivemagnetronco-sputtering.TheresultsofmagneticmeasurementsshowthatdifferentoxygenpartialpressuresandannealingtemperatureshavegreatinfluenceonthemagnetismofdopedZnOthinfilms.ThefactthatonlythefilmspreparedatanAr:O2ratioof1:1andannealedat200oCinvacuumshowclearroomtemperatureferromagnetismwhichdisappearsafterannealedat500oCinvacuumindicatesthattheferromagnetismmayberelatedtointernallatticestress.Theseferromagneticfilmshavebeenannealedat200oCinairsubsequentlyandshowlowercoercivityandenhancedsaturationmagnetization,whichmaybeattributedtotheannealinginaircausingmoreinterstitialAlatomstoconvertintosubstitutionalAlions,andconsequentlyincreasingthechargetransferbetweentheAlandtheZnOmatrix,leadingtoincreasedmagnetism.

机译：AldopedZnOfilmshavebeenpreparedusingdifferentAr：O2ratiosandannealingconditionsonglasssubstratesbydcreactivemagnetronco-sputtering.TheresultsofmagneticmeasurementsshowthatdifferentoxygenpartialpressuresandannealingtemperatureshavegreatinfluenceonthemagnetismofdopedZnOthinfilms.ThefactthatonlythefilmspreparedatanAr：O2ratioof1：1andannealedat200oCinvacuumshowclearroomtemperatureferromagnetismwhichdisappearsafterannealedat500oCinvacuumindicatesthattheferromagnetismmayberelatedtointernallatticestress.Theseferromagneticfilmshavebeenannealedat200oCinairsubsequentlyandshowlowercoercivityandenhancedsaturationmagnetization，whichmaybeattributedtotheannealinginaircausingmoreinterstitialAlatomstoconvertintosubstitutionalAlions，andconsequentlyincreasingthechargetransferbetweentheAlandtheZnOmatrix，leadingtoincreasedmagnetism。

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《Optoelectronics and Advanced Materials-Rapid Communications 》 |2013年第2013期| 共页
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Influence of oxygen partial pressure and annealing on magnetic properties of Al -doped ZnO thin films

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