Investigations of pulsed laser deposited TiN thin films for titanium implants

摘要

TiN thin films were deposited at room temperature on polished Ti samplesby PLD. GIXRD investigations showed that films were crystalline, with grain sizesaround 25 nm. Simulations of XRR curves indicated that the layers were dense andonly slightly rougher than Ti substrates. Nanoindentation results showed that TiNfilms possessed a hardness of 26.8 GPa, much harder than Ti substrate, while scratchand wear tests found that films were adherent and exhibited a low friction coefficientof 0.16. Electrochemical tests performed in SBF indicated that the coated Ti samplesexhibited significantly better behavior against corrosion than bare Ti samples.