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Photosynthetic UV stress tolerance of the Antarctic snow alga Chlorella sp. modified by enhanced temperature?

机译:南极雪藻小球藻的光合紫外线胁迫耐受性。通过提高温度来改变?

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Background Photosynthetic characteristics and the effect of UV radiation and elevated temperature measured were studied in Chlorella sp . isolated from a snow microalgal community at King George Island, Maritime Antarctica through the chlorophyll florescence (rapid light curves and maximum quantum yield, respectively). The environmental context was monitored through measurements of spectral depth profiles of solar radiation (down to 40 cm) in the snowpack as well as a through continuous recording of temperature and PAR using dataloggers located at different depths (0–30 cm) within the snow column. Results The photochemistry of Chlorella sp . was affected by UV radiation in a 12-h laboratory exposure under all studied temperatures (5, 10, 15, 20 °C): the algae exposed to PAR + UV-A radiation were inhibited by 5.8 % whilst PAR + UV-A + UV-B radiation decreased Fv/Fm by 15.8 %. In both treatments the 12-h recovery after UV exposure was almost complete (80–100 %). Electron transport based P-I curve parameters maximal electron transport rate (ETRmax), photosynthetic efficiency (α) and the saturating irradiance (Ek) no varied in response to different temperatures. Conclusions Results revealed that Chlorella sp . not only shows high photosynthetic efficiency at ambient conditions, but also exhibits tolerance to solar radiation under higher temperatures and possessing a capacity for recovery after inhibition of photosynthesis by UV radiation.
机译:背景研究了小球藻的光合特性,紫外光辐射和高温的影响。通过叶绿素花序从南极海洋国王乔治岛的一个微雪藻类群落中分离出来(分别是快速光曲线和最大量子产率)。通过测量积雪中太阳辐射的光谱深度分布图(低至40 cm)以及使用位于雪柱内不同深度(0–30 cm)的数据记录仪连续记录温度和PAR来监控环境。结果小球藻的光化学。在所有研究温度(5、10、15、20°C)下在12小时的实验室暴露中均受到UV辐射的影响:暴露于PAR + UV-A辐射的藻类被抑制了5.8%,而PAR + UV-A + UV-B辐射使F v / F m 降低15.8%。在这两种处理中,紫外线照射后的12小时恢复都几乎完成(80–100%)。基于电子传输的P-I曲线参数最大电子传输速率(ETR max ),光合效率(α)和饱和辐照度(E )不会随温度的变化而变化。结论结果显示小球藻(Chlorella sp。)不仅在环境条件下显示出高的光合作用效率,而且在较高温度下表现出对太阳辐射的耐受性,并且具有在通过紫外线辐射抑制光合作用后的恢复能力。

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