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Direct imaging of electron transfer and its influence on superconducting pairing at FeSe/SrTiO3 interface

机译:FeSe / SrTiO3界面上电子转移的直接成像及其对超导配对的影响

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The exact mechanism responsible for the significant enhancement of the superconducting transition temperature ( T c) of monolayer iron selenide (FeSe) films on SrTiO3 (STO) over that of bulk FeSe is an open issue. We present the results of a coordinated study of electrical transport, low temperature electron energy-loss spectroscopy (EELS), and high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) measurements on FeSe/STO films of different thicknesses. HAADF-STEM imaging together with EELS mapping across the FeSe/STO interface shows direct evidence of electrons transferred from STO to the FeSe layer. The transferred electrons were found to accumulate within the first two atomic layers of the FeSe films near the STO substrate. An additional Se layer is also resolved to reside between the FeSe film and the TiO x -terminated STO substrate. Our transport results found that a positive backgate applied from STO is particularly effective in enhancing T c of the films while minimally changing the carrier density. This increase in T c is due to the positive backgate that “pulls” the transferred electrons in FeSe films closer to the interface and thus enhances their coupling to interfacial phonons and also the electron-electron interaction within FeSe films.
机译:导致SrTiO 3 (STO)上的单层硒化铁(FeSe)薄膜的超导转变温度(T c )显着提高的确切机理,其机理要优于块状FeSe是一个开放的问题。我们提出了在不同厚度的FeSe / STO薄膜上进行电传输,低温电子能量损失谱(EELS)和高角度环形暗场扫描透射电子显微镜(HAADF-STEM)测量的协调研究结果。 HAADF-STEM成像以及跨FeSe / STO界面的EELS映射显示了从STO转移到FeSe层的电子的直接证据。发现转移的电子积聚在STO衬底附近的FeSe膜的前两个原子层中。还解决了额外的Se层驻留在FeSe膜和TiO x 端接的STO衬底之间的问题。我们的运输结果发现,在最小化载流子密度的同时,从STO施加的正背栅在增强薄膜的T c 方面特别有效。 T c 的增加是由于正背栅“拉” FeSe膜中转移的电子更靠近界面,从而增强了它们与界面声子的耦合以及FeSe膜中的电子电子相互作用。 。

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