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Stress changes in H2-loaded SMF optical fibers induced by cw-Ar+ 244 nm irradiation

机译:cw-Ar + 244 nm辐照引起H 2 加载SMF光纤的应力变化

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Bragg gratings were inscribed in H2-loaded SMF-28e optical fibers and measured for axial stress changes for various exposure doses. Mean refractive index changes as high as 7.5 × 10−3 were observed under cw-244 nm irradiation of 143 W/cm2. Bragg grating reflectivity 99% was achieved for 0.7 mm long (1/e2) gratings. Axial stress measurements realized before and after UV exposure of the fibers, show two competing dose-dependent photosensitivity mechanisms: Negative stress changes at the early stages of exposure and positive stress changes for high exposures.
机译:将布拉格光栅刻在装有H2的SMF-28e光纤中,并测量各种曝光剂量下的轴向应力变化。在143 W / cm2的cw-244 nm辐照下观察到平均折射率变化高达7.5×10-3。对于0.7毫米长(1 / e2)的光栅,布拉格光栅的反射率> 99%。在纤维暴露于紫外线之前和之后进行的轴向应力测量显示出两种相互竞争的剂量依赖性光敏性机理:暴露初期的负应力变化和高暴露时的正应力变化。

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