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首页> 外文期刊>Open Journal of Fluid Dynamics >MHD Mass Transfer Flow past a Vertical Porous Plate Embedded in a Porous Medium in a Slip Flow Regime with Thermal Radiation and Chemical Reaction
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MHD Mass Transfer Flow past a Vertical Porous Plate Embedded in a Porous Medium in a Slip Flow Regime with Thermal Radiation and Chemical Reaction

机译:MHD传质流经过具有热辐射和化学反应的滑流条件下嵌入多孔介质中的垂直多孔板

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This problem presents the effects of thermal radiation and chemical reaction on MHD unsteady mass transfer flow past a semi-infinite vertical porous plate embedded in a porous medium in a slip flow regime with variable suction. A magnetic field of uniform strength is assumed to be applied transversely to the direction of the main flow. Perturbation technique is applied to transform the non-linear coupled governing partial differential equations in dimensionless form into a system of ordinary differential equations. The resulting equations are solved analytically and the solutions for the velocity, temperature and concentration fields are obtained. The effects of various flow parameters on velocity, temperature and concentration fields are presented graphically. For different values of the flow parameters involved in the problem, the numerical calculations for the Nusselt number, Sherwood number and skin-friction co-efficient at the plate are performed in tabulated form. It is seen that chemical reaction causes the velocity field and concentration field to decrease and the chemical reaction decreases the rate of viscous drag at the plate.
机译:该问题提出了热辐射和化学反应对通过可变吸力的滑流状态下通过嵌入多孔介质中的半无限垂直多孔板的MHD非稳态传质流的影响。假定均匀强度的磁场横向于主流方向施加。应用摄动技术将无量纲形式的非线性耦合控制偏微分方程转化为常微分方程组。通过解析求解所得方程,并获得速度,温度和浓度场的解。用图形表示了各种流量参数对速度,温度和浓度场的影响。对于涉及该问题的流动参数的不同值,以表格形式对板中的努塞尔数,舍伍德数和表皮摩擦系数进行数值计算。可以看出,化学反应使速度场和浓度场减小,化学反应使板上的粘滞阻力降低。

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