A state-of-the-art review in the field of cluster beams and energetic cluster-surface interaction is presented. Ionised cluster beams are considered to be a controllable and versatile tool for modification and processing of surfaces and near-surface layers on an atomic scale as an alternative to ion implantation, ion assisted deposition and some other methods. A brief introduction to the history of cluster beams is given as well as a discussion of the capabilities of cluster beams for a variety of applications in material science, electronics and optics. Techniques for producing atomic and molecular clusters are described. Energetic cluster deposition and cluster implantation as well as related physical effects are the main emphasis of the review. In the final part of the paper the attention is focused on the study of surface erosion (crater formation) under energetic cluster ion impact.
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